Igicapo (Gukura)Mixed gas

Mu nganda za semiconductor, gaze yakundaga gukura ibintu bimwe cyangwa byinshi byibikoresho kubijyanye na chique vapor kumurongo watoranijwe witonze yitwa gaze ya eptaxial.

Mubisanzwe wakoresheje imyuka ya silicon irimo dichlorosilane, tetrachlorilane, tetrachloride ya silicon naSilane. Ahanini ikoreshwa kuri Epitaxial Kubitsa, Filimide ya Silicon Nitride, Ikimenyetso cya Silicon Silicon kubitsa byizuba hamwe nabandi baPhoreceptors, nibindi.

Kubika imiti (CVD) gaze ivanze

CVD nuburyo bwo kubitsa ibintu bimwe nibibazo byicyiciro cya gaze ukoresheje ibice bihindagurika, ni ukuvuga uburyo bwo gushiraho filime ukoresheje icyiciro cyicyiciro cya gaze. Ukurikije ubwoko bwa firime yashizweho, imiti ihinduranya imiti (CVD) ikoreshwa nayo iratandukanye.

DopingGazi ivanze

Mu gukora ibikoresho bya semiconductor hamwe n'umuzatsi uhuriweho, umwanda runaka wasangaga mu bikoresho Semiconductor ubwoko bukenewe, PN. Gas

Ahanini ikubiyemo arsine, fosphine, fosifore trifluoride, fosifori penfuride, muri Arsenic trifluoride, muri Arsenic Trifluoride, Arsenic Trifluoride, Arsenic Penfuoride,Boron Trifluoride, diborane, nibindi

Mubisanzwe, isoko y'ibigega ivanze na gaze itwara (nka argon na azote) mu nama y'abaminisitiri. Nyuma yo kuvanga, urujya n'uruza rwa gaze rukomeje guterana mu itanura ritandukanye kandi rizengurutse wafer, tugabitsa ibitego hejuru ya wafer, hanyuma bikerekeza kuri silicon kugira ngo bibe imbaho ​​zimukira muri Silicon.

ETCHINGImvange ya gaze

ETCHING ni ukureka ubuso butunganya (nka firime yicyuma, firime ya silicon, nibindi) Kububiko bwa Makeresiste, mugihe uzigama amafoto ahinnye, kugirango abone icyitegererezo cyamafoto asabwa ku buso bwa substrate.

ETCHING Uburyo burimo gukubitwa imiti itose no kumema imiti. Gazi ikoreshwa mumatizi yumye yitwa esching gaze.

ETCHING Gazi isanzwe ya gaze (Halide), nkaCarbone tetrafluoride, azote trifluoride, Trifluoromethane, Hexafluoroethane, PerfluoroPropane, nibindi.