Imyuka idasanzwe

  • Amazi ya Tetrafluoride (SF4)

    Amazi ya Tetrafluoride (SF4)

    EINECS OYA: 232-013-4
    URUBANZA OYA: 7783-60-0
  • Oxide ya Nitrous (N2O)

    Oxide ya Nitrous (N2O)

    Okiside ya Nitrous, izwi kandi nka gaze iseka, ni imiti iteje akaga hamwe na formula ya chimique N2O. Ni gaze itagira ibara, ihumura neza. N2O ni okiside ishobora gushyigikira gutwikwa mubihe bimwe na bimwe, ariko igahagarara mubushyuhe bwicyumba kandi ikagira ingaruka nkeya. , kandi irashobora gusetsa abantu.
  • Carbone Tetrafluoride (CF4)

    Carbone Tetrafluoride (CF4)

    Carbone tetrafluoride, izwi kandi nka tetrafluoromethane, ni gaze itagira ibara ku bushyuhe busanzwe no ku muvuduko, idashonga mu mazi. Gazi ya CF4 kuri ubu niyo ikoreshwa cyane na plasma etching gaze munganda ziciriritse. Ikoreshwa kandi nka gaze ya laser, firigo ya kirogenike, solvent, lubricant, ibikoresho byokoresha, hamwe na coolant kubitereko bya infragre.
  • Fluoride ya Sulfuryl (F2O2S)

    Fluoride ya Sulfuryl (F2O2S)

    Sulfuryl fluoride SO2F2, gaze yuburozi, ikoreshwa cyane nkudukoko. Kuberako fluoride ya sulfuryl ifite ibiranga gukwirakwizwa gukomeye no gutembera, kwica udukoko twagutse, urugero ruto, umubare muto usigaye, umuvuduko wica udukoko twihuta, igihe gito cyo gukwirakwiza gaze, gukoresha neza ubushyuhe buke, nta ngaruka ku gipimo cyo kumera nuburozi buke, nibindi byinshi Irakoreshwa cyane mububiko, amato yimizigo, inyubako, ingomero zamazi, gukumira igihe, nibindi.
  • Silane (SiH4)

    Silane (SiH4)

    Silane SiH4 ni gazi itagira ibara, uburozi kandi ikora cyane gaze yubushyuhe n'ubushyuhe busanzwe. Silane ikoreshwa cyane mugukura kwa epitaxial ya silicon, ibikoresho fatizo bya polysilicon, okiside ya silicon, nitride ya silicon, nibindi, ingirabuzimafatizo zuba, fibre optique, gukora ibirahuri byamabara, hamwe no guta imyuka ya chimique.
  • Octafluorocyclobutane (C4F8)

    Octafluorocyclobutane (C4F8)

    Octafluorocyclobutane C4F8, ubuziranenge bwa gaze: 99,999%, bikunze gukoreshwa nkibiryo bya aerosol hamwe na gaze yo hagati. Bikunze gukoreshwa muri semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition), C4F8 ikoreshwa mugusimbuza CF4 cyangwa C2F6, ikoreshwa mugusukura gaze hamwe na semiconductor inzira ya gaz.
  • Oxide ya Nitric (OYA)

    Oxide ya Nitric (OYA)

    Gazi ya nitide ni uruvange rwa azote hamwe na formula ya chimique OYA. Ni gaze itagira ibara, idafite impumuro nziza, uburozi butangirika mumazi. Okiside ya Nitricike ikora cyane kandi ikora na ogisijeni ikora gaze ya gaze ya azote (NO₂).
  • Hydrogen Chloride (HCl)

    Hydrogen Chloride (HCl)

    Hydrogen chloride HCL Gazi ni gaze itagira ibara ifite impumuro nziza. Umuti wacyo wamazi witwa hydrochloric aside, izwi kandi nka hydrochloric aside. Hydrogene chloride ikoreshwa cyane mugukora amarangi, ibirungo, imiti, chloride zitandukanye hamwe na inhibitori ya ruswa.
  • Hexafluoropropylene (C3F6)

    Hexafluoropropylene (C3F6)

    Hexafluoropropylene, formulaire ya chimique: C3F6, ni gaze itagira ibara kubushyuhe busanzwe hamwe nigitutu. Ikoreshwa cyane cyane mugutegura ibicuruzwa bitandukanye bya fluor birimo imiti myiza yimiti, abahuza imiti, ibikoresho bizimya umuriro, nibindi, kandi birashobora no gukoreshwa mugutegura ibikoresho bya polymer birimo fluor.
  • Amoniya (NH3)

    Amoniya (NH3)

    Amoniya y'amazi / anhidrous ammonia ni ibikoresho byingenzi bya shimi bifite imiti myinshi. Ammonia y'amazi irashobora gukoreshwa nka firigo. Ikoreshwa cyane cyane mu gukora aside nitric, urea nandi mafumbire mvaruganda, kandi irashobora no gukoreshwa nkibikoresho fatizo byubuvuzi nudukoko. Mu nganda zirwanaho, zikoreshwa mu gukora moteri ya roketi na misile.