Gazi ya Laser

Gazi ya Laser ikoreshwa cyane cyane muri laser annealing na gaze ya lithographie mu nganda za elegitoroniki. Kwungukira mu guhanga udushya twa terefone igendanwa no kwagura ahantu hasabwa, igipimo cy’isoko rya polysilicon yo mu bushyuhe buke buzarushaho kwagurwa, kandi uburyo bwo guhuza lazeri bwazamuye imikorere ya TFTs. Muri gaze ya neon, fluor, na argon ikoreshwa muri laser ya ArF excimer laser yo gukora semiconductor, neon ifite ibice birenga 96% bya gaz ya laser. Hamwe no kunonosora ikoranabuhanga rya semiconductor, ikoreshwa rya lazeri ya excimer ryiyongereye, kandi hashyizweho ikoranabuhanga ryerekanwa kabiri ryatumye ubwiyongere bukabije bwa gaze ya neon ikoreshwa na lazeri ya ArF. Kwungukirwa no guteza imbere imyuka ya elegitoroniki yihariye, abakora mu gihugu bazagira umwanya mwiza wo kuzamuka kw isoko mugihe kiri imbere.

Imashini ya Lithographie nigikoresho cyibanze cyo gukora semiconductor. Lithographie isobanura ubunini bwa transistors. Iterambere rihuriweho nuruhererekane rwimyandikire yinganda nurufunguzo rwo gutera imbere kwimashini ya lithographie. Ibikoresho bihuye na semiconductor nka Photoresist, gazi ya Photolithography, Photomask, hamwe no gutwikira hamwe nibikoresho biteza imbere bifite tekinoroji. Gazi ya Lithographie ni gaze imashini ya lithographie itanga laser ultraviolet. Imyuka itandukanye ya lithographie irashobora gutanga amasoko yumucyo yuburebure butandukanye, kandi uburebure bwabyo bugira ingaruka ku buryo butaziguye ku ikemurwa ry’imashini ya lithographie, ikaba ari imwe mu mikorere y’imashini ya lithographie. Muri 2020, igurishwa rusange ry’imashini za lithographie zizaba 413, muri zo kugurisha ASML ibice 258 bingana na 62%, kugurisha Canon ibice 122 bingana na 30%, Nikon yagurishije ibice 33 bingana na 8%.