Ni ubuhe buryo bwakoreshejwe bwa ETCHING BECHING BUMBUKA?

Ikoranabuhanga ryumye nimwe mubikorwa byingenzi. Gazi yumye nigikoresho cyingenzi muri semiconductor inganda na gaze yingenzi kuri plasma enching. Imikorere yayo igira ingaruka muburyo bwiza nibikorwa byanyuma. Iyi ngingo igaragara cyane ni ibihe bintu byakoreshejwe bikunze gukoreshwa muburyo bwumutse.

Imiyoboro ishingiye kuri gaze: nkaCarbone Tetrafluoride (CF4), Hexafluontane (C2F6), Trifluoromethane (Chf3) na PerfluoroPropane (C3F8). Izi myuka zirashobora kubyara neza fluoriside ihindagurika mugihe wa Etching silicon na silicon compound, bityo igera kuri gukuraho ibikoresho.

Imyuka ishingiye ku chlorine: nka chlorine (cl2),Boron Trichloride (BCL3)na silicon tetrachloride (Sicl4). Imyuka ishingiye ku chlorine irashobora gutanga chloride ion mugihe cya etchling, ifasha kunoza igipimo cya ETCHIGS no guhitamo.

Imyuka ishingiye kuri Bromine: nka Bromine (BR2) na Bromine Iyode (IBR). Imyuka ishingiye kuri Bromine irashobora gutanga imikorere myiza mubikorwa bimwe na bimwe byanditseho, cyane cyane iyo bigaragambije ibikoresho bikomeye nka charbide ya silicon.

Imyuga ishingiye kuri nitrogen na ogisijeni ishingiye kuri ogisijeni: nka azote trifluoride (nf3) na ogisijeni (o2). Iyi myuka isanzwe ikoreshwa muguhindura imiterere yimikorere yo kunoza no kunoza uburyo bwo guhitamo no kwerekanwa bya ETCHING.

Iyi myugwa igera ku gutwikiranya ibintu hejuru yibikoresho binyuze mu guhuza imiti no kumera ku mubiri no kwibigira mu mashyi ya plasma. Guhitamo gaze ya ETCHING biterwa n'ubwoko bwibikoresho bigomba kuryozwa, guhitamo ibisabwa byindobo, nibipimo byifuzwa.