Urutonde ruhendutse Urutonde rwa gaze yihariye Ubushinwa Gutanga Electron / Semiconductor Icyiciro cya 99,999% Isuku ya Carbone Tetrafluoride / Tetrafluoromethane CF4 Igiciro cya gazi

"Ubunyangamugayo, guhanga udushya, imbaraga, no gukora neza" birashobora kuba igitekerezo gihoraho cyumuryango wacu muri kiriya gihe kirekire cyo gushyiraho hamwe nabakiriya kubwinyungu zabo bwite no kunguka inyungu kubiciro bihendutse kurutonde rwimyuka yihariye Ubushinwa Gutanga Electron / Semiconductor Icyiciro cya 99.999% Tetrafluoride / Tetrafluoromethane CF4 Igiciro cya gazi, Kuba isosiyete ikura cyane, ntidushobora gukora neza, ariko turagerageza gukora ibishoboka byose kugirango mube umufatanyabikorwa wawe mwiza.
"Ubunyangamugayo, guhanga udushya, imbaraga, no gukora neza" birashobora kuba imyumvire idahwitse yumuryango wacu muri kiriya gihe kirekire cyo gushiraho hamwe nabakiriya kugirango basubiranamo kandi bunguka inyungu kuriUbushinwa CF4 na CF4 Gazi, “Shiraho indangagaciro, ukorera abakiriya!”niyo ntego dukurikirana.Turizera rwose ko abakiriya bose bazashyiraho ubufatanye burambye kandi bwungurana ibitekerezo natwe.Niba wifuza kubona ibisobanuro birambuye kubyerekeye isosiyete yacu, Witondere kuvugana natwe nonaha!

Ibipimo bya tekiniki

Carbone tetrafluoride ni hydrocarubone ya halogene hamwe na chimique CF4.Irashobora gufatwa nka hydrocarubone ya halogene, metani ya halogene, parfluorocarubone, cyangwa nkikintu kidasanzwe.Carbone tetrafluoride ni gaze itagira ibara kandi idafite impumuro nziza, idashobora gushonga mumazi, gushonga muri benzene na chloroform.Ihamye munsi yubushyuhe busanzwe nigitutu, irinde okiside ikomeye, ibintu byaka cyangwa byaka.Gazi idashobora gukongoka, umuvuduko wimbere wa kontineri uziyongera mugihe uhuye nubushyuhe bwinshi, kandi harikibazo cyo guturika no guturika.Ifite imiti ihamye kandi ntishobora gutwikwa.Gusa amazi ya ammonia-sodium reagent arashobora gukora mubushyuhe bwicyumba.Carbone tetrafluoride ni gaze itera ingaruka za parike.Irahagaze neza, irashobora kuguma mu kirere igihe kirekire, kandi ni gaze ya parike ikomeye cyane.Carbone tetrafluoride ikoreshwa mugikorwa cya plasma yo gutembera kwinzira zitandukanye.Ikoreshwa kandi nka gaze ya lazeri, kandi ikoreshwa muri firigo ikonjesha ubushyuhe buke, ibishishwa, amavuta yo kwisiga, ibikoresho bikingira, hamwe na coolant kubushakashatsi bwa infragre.Nibikoresho bikoreshwa cyane muri plasma etching ya gazi munganda ziciriritse.Ni uruvange rwa tetrafluoromethane gaze isukuye cyane na tetrafluoromethane gazi yuzuye cyane na ogisijeni yuzuye.Irashobora gukoreshwa cyane muri silicon, dioxyde ya silicon, nitride ya silicon, nikirahure cya fosifosilike.Kuzuza ibikoresho bya firime yoroheje nka tungsten na tungsten nabyo bikoreshwa cyane mugusukura hejuru yibikoresho bya elegitoroniki, kubyara izuba, tekinoroji ya laser, gukonjesha ubushyuhe buke, kugenzura kumeneka, hamwe nogukoresha ibikoresho byacapwe.Ikoreshwa nka firigo yo hasi yubushyuhe na plasma yumye ya tekinoroji yumuzunguruko.Icyitonderwa cyo kubika: Bika mu bubiko bukonje, buhumeka butabikwa.Irinde umuriro nubushyuhe.Ubushyuhe bwo kubika ntibugomba kurenga 30 ° C.Igomba kubikwa ukwayo biturutse ku byoroshye (gutwikwa) gutwikwa na okiside, kandi ikirinda ububiko buvanze.Ahantu ho guhunika hagomba kuba hafite ibikoresho byo kuvura byihutirwa.

Gusaba:

① Firigo:

Tetrafluoromethane rimwe na rimwe ikoreshwa nka firigo yo hasi.

Etching:

Ikoreshwa muri electronics microfabrication yonyine cyangwa ifatanije na ogisijeni nka plasma etchant ya silicon, dioxyde de silicon, na nitride ya silicon.

Porogaramu isanzwe:

Ibyiza:

Isuku ryinshi, ibikoresho bigezweho;

②ISO ukora icyemezo;

Gutanga vuba;

Sisitemu imwe yo gusesengura sisitemu yo kugenzura ubuziranenge muri buri ntambwe;

RequirementIbisabwa byinshi hamwe nuburyo bwitondewe bwo gukora silinderi mbere yo kuzuza;